Volume 525 symposium w rapid thermal integrated processing vii 1998 21 the effect of chamber components on wafer temperature response in an rtp system. This paper reviews work to develop and improve the temperature measurement and control technology of a commercial rapid thermal processing rtp system a description of the main features of this system is given which includes a concentric multi zone lamp heating source multi point temperature measurement system and real time wafer . Rapid thermal and integrated processing ii volume 303 mrs proceedings jeffrey c gelpey j kiefer elliott jimmie j wortman atul ajmera on amazoncom free shipping on qualifying offers the mrs symposium proceeding series is an internationally recognised reference suitable for researchers and practitioners. This bar code number lets you verify that youre getting exactly the right version or edition of a book the 13 digit and 10 digit formats both work. The mrs proceedings series on rapid thermal processing rtp has become the predominant international forum for research in this exciting and fast growing field
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