Chamber a microwave after glow rpecvd chamber and a rapid thermal annealing chamber the tool is designed to allow high flexibility with in situ multi sequential processing capability. Volume 429 symposium n rapid thermal and integrated processing v 1996 127 rapid thermal dopants diffusion and surface passivation for silicon solar cells applications. Rapid thermal processing rtp has become a key technique because its single wafer process can accommodate the reduced thermal budget requirements arising from shrinking the dimensions of devices and the trend to larger wafers. Ditchfield r seebauer eg 1996 general kinetic rules for rapid thermal processing materials research society symposium proceedings vol 429 pp 133 138 ditchfield r seebauer eg general kinetic rules for rapid thermal processing . Rapid thermal and integrated processing v symposium held april 8 12 1996 san francisco california usa
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